![]() ![]() Index of the Cu 3N film are 1.44 eV and 2.14, respectively, The experimentally obtained optical band gap and refractive The Cu 3N thin film deposited by the DC magnetron-sputtering technique showsĪ polycrystalline structure with a nonstoichiometric Cu 3N phase. The density of states exhibitsĪ negligible deformation in Cu–N bonding. The conduction band is dominated by a very smallĪmount of Cu 3p and N 2p orbitals. Of their antibonding states which are also observed by molecular orbitals Orbitals in the near-valence band region ( M) because ![]() The band structure of the Cu 3N unit cell shows a strong hybridization of Cu 3d and N 2p Term is added in the local density approximation approach for improvement Of a Cu 3N film is performed by the first-principles study ![]()
0 Comments
Leave a Reply.AuthorWrite something about yourself. No need to be fancy, just an overview. ArchivesCategories |